ETMF 3113. Fundamental of Optics. (3) Prerequisite: algebra, trigonometry, plane geometry, and physics. A phenomenological introduction to applied optics; interactions between light and materials; properties of light; lenses and mirrors; simple optical systems; interference and diffraction; introductions to optical fibers, lasers, and holography. (On demand) 

ETMF 3114. Thin Films and Optical Coatings. (3) Prerequisite: algebra, trigonometry, plane geometry, and physics. Vacuum technology, process controls, and special techniques used in the fabrication of thin films and the surfaces on which they are prepared; ways in which the optical tribological, and electronic industries utilize these structures in their products. (On demand) 

ETMF 3131. Computer Integrated Manufacturing (CIM). (3) Automated manufacturing systems involving computers to monitor vendor input, process variations, component selection and routing, and test and evaluation of products. Applications involving integration of computer aided design (CAD) systems with computer aided manufacturing (CAM) systems. (On demand) 

ETMF 3141. Industrial Applied Optical Systems. (3) Prerequisite: ETGR 3171. The applications of electro-optical technology in manufacturing and industrial systems is investigated. The fundamentals of applied optics, laser theory and semi-conductor optical devices will be reviewed. (On demand) 

ETMF 3141L. Applied Optical Systems Laboratory. (1) Corequisite: ETMF 3141. Applications of electro-optical technology in manufacturing systems. Laboratory experiments demonstrating the use of lasers in the following manufacturing and industrial applications will be performed: cutting, machining, welding, measurement, marking, and control of processes; machine vision systems, sorting, process control, and real-time quality control; bar code systems; optical character recognition; optical data transmission. (On demand)  

ETMF 3153. Optics Laboratory. (2) Prerequisite or corequisite: ETMF 3113. Experiments designed to illustrate properties of light and optical systems; reflection and refraction; lenses and lens systems; optical instruments; interference and diffraction; polarized light; laser principles. (On demand) 

ETMF 3181.  Digital Process Control. (3) Prerequisite: ETMF 3164. Applications and programming of microprocessors and programmable controllers for control of manufacturing processes. Interfaces with sensors, actuators, and computer systems. Includes classroom and laboratory demonstrations. (On demand) 

ETMF 3211. Topics in Precision Manufacturing. (3) Senior seminar in selected areas of modern production of both conventional and micro-miniaturized products; surface mount technology for electronic components; manufacturing in the clean room environment; metrology; manufacture of micro-miniature mechanical systems; vacuum coating and plating systems; systems for automatic process control and product inspection. (On demand) 

ETMF 3251. CIM Laboratory. (2) (W) Experiments with computer control of processes, including numerical control and robotics. Measurement of physical variables for monitoring, controlling, and testing production operations. Application of microprocessors and micro computers to system control and status reporting. One class hour, three lab hours per week. (On demand)